Fabrication and characterisation of Frequency Selective Surface (FSS) for Terahertz Sensing Application

Abstract A frequency selective surface (FSS) structure based on a circular slot with 28 to 31 μm was fabricated using Electron Beam Lithography combined wet etching technique 400 thick quartz substrate. The pattern, designed the CST software, transferred during (EBL) exposure 100 kV voltage acceleration, 2 nA of e-beam current, and line dosage 1000 μC . 0.5 aluminium layer deposited substrate thermal evaporator technique. thickness confirmed by laser microscope profiler measurement. investigation shows that 20 seconds is optimal time for producing desired FSS compared 40 60 seconds. samples metrology examined an optical microscope, Field Emission Scanning Microscope (FESEM) Atomic Force (AFM). material compositions were Energy Dispersive X-ray (EDX) Results show that, average, there are ±1.5 tolerance produced sample size pattern simulation results. performance slightly shifted in from actual 1.80 THz 1.79 THz, whereas transmission magnitude has increased 0.03 0.91 0.94.